25th European Mask and Lithography Conference (12-15 January 2009, Dresden, Germany)Behringer, Uwe F. W.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, various pagings, isbn 978-0-8194-7770-5 0-8194-7770-2Conference Proceedings

E-beam Mask-less Lithography: prospects and challengesRONSE, Kurt.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7637, issn 0277-786X, isbn 978-0-8194-8051-4 0-8194-8051-7, 76370A.1-76370A.7Conference Paper

Writing wavy metal 1 shapes on 22 nm Logic Wafers with Less Shot CountZABLE, Harold R; FUJIMURA, Aki; KOMAGATA, Tadashi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7748, issn 0277-786X, isbn 0-8194-8238-2 978-0-8194-8238-9, 1Vol, 77480X.1-77480X.10Conference Paper

Alternative lithographic technologies (24-26 February 2009, San Jose, California, United States)Schellenberg, F. M; La Fontaine, Bruno M.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7271, issn 0277-786X, isbn 978-0-8194-7524-4 0-8194-7524-6, 2 vol, 2, isbn 978-0-8194-7524-4 0-8194-7524-6Conference Proceedings

Improvement of polymer type EB resist sensitivity and line edge roughnessOTANI, Makoto; ASADA, Hironori; TSUNODA, Hosei et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8081, issn 0277-786X, isbn 978-0-8194-8673-8, 808107.1-808107.8Conference Paper

Laser direct-write processing : Laser direct-write processingARNOLD, Craig B; PIQUE, Alberto.MRS bulletin. 2007, Vol 32, Num 1, pp 9-11, issn 0883-7694, 3 p.Article

A hybrid of microreplication and mask-less photolithography for creating dual porosity and textured surface membranesHAGEDON, M; HEIKENFELD, J.Journal of micromechanics and microengineering (Print). 2013, Vol 23, Num 11, issn 0960-1317, 117005.1-117005.8Article

A dual step precision multi-DOF stage for maskless digital lithographyYONG SEOK IHN; JI, Sang-Hoon; MOON, Hyungpil et al.Microsystem technologies. 2012, Vol 18, Num 9-10, pp 1741-1750, issn 0946-7076, 10 p.Conference Paper

NGL Masks: Development Status and IssueHAYASHI, Naoya; ABE, Tsukasa; SHIMOMURA, Takeya et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7985, issn 0277-786X, isbn 978-0-8194-8553-3, 798505.1-798505.9Conference Paper

MAGIC : a European program to push the insertion of maskless lithographyPAIN, L; ICARD, B; KRETZ, J et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69211S.1-69211S.12, issn 0277-786X, isbn 978-0-8194-7106-2Conference Paper

High- sensitivity interferometric schemes for ML2 micromirror calibrationsWANG, Jen-Shiang; SOLGAARD, Olav; NEUREUTHER, Andrew R et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6194-6, 2Vol, vol 1,615112.1-615112.8Conference Paper

Direct writing via electron-driven reactionsSEUNG WHAN LEE; MOHAN SANKARAN, R.Materials today (Kidlington). 2013, Vol 16, Num 4, pp 117-122, issn 1369-7021, 6 p.Article

Investigation of the maskless lithography technique for the rapid and cost-effective prototyping of microfluidic devices in laboratoriesNAN XIANG; HONG YI; KE CHEN et al.Journal of micromechanics and microengineering (Print). 2013, Vol 23, Num 2, issn 0960-1317, 025016.1-025016.11Article

Fabrication of suspended electrokinetic microchannels from directly written sacrificial polymer fibersBERRY, Scott M; ROUSSEL, Thomas J; CAMBRON, Scott D et al.Microfluidics and nanofluidics (Print). 2012, Vol 13, Num 3, pp 451-459, issn 1613-4982, 9 p.Article

Focused ion beam mjicro-and nanoengineering : Focused ion beam microscopy and micromachiningLANGFORD, Richard M; NELLEN, Philipp M; GIERAK, Jacques et al.MRS bulletin. 2007, Vol 32, Num 5, pp 417-423, issn 0883-7694, 7 p.Article

FPGA based high-speed system solutions for innovative maskless lithography systemsVOSS, Sven-Hendrik; TALMI, Maati.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6358-2, vol 2, 62832K.1-62832K.12Conference Paper

Maskless, fast and highly selective etching of fused silica with gaseous fluorine and gaseous hydrogen fluorideVENTURINI, Francesco; MARTINEZ VAZQUEZ, Rebeca; OSELLAME, Roberto et al.Journal of micromechanics and microengineering (Print). 2014, Vol 24, Num 2, issn 0960-1317, 025004.1-025004.7Article

Novel electrically driven direct-writing methods with managed control on in-situ shape and encapsulation polymer formingAHMAD, Z; NANGREJO, M; RASEKH, M et al.International journal of material forming. 2013, Vol 6, Num 2, pp 281-288, issn 1960-6206, 8 p.Article

High-Throughput Electron Beam Direct Writing of VIA Layers by Character Projection with One-Dimensional VIA Characters : VLSI Design and CAD AlgorithmsIKENO, Rimon; MARUYAMA, Takashi; KOMATSU, Satoshi et al.IEICE transactions on fundamentals of electronics, communications and computer science. 2013, Vol 96, Num 12, pp 2458-2466, issn 0916-8508, 9 p.Article

Maskless convex corner compensation technique on a (10 0) silicon substrate in a 25 wt% TMAH water solutionSMILJANIC, Milče M; JOVIC, Vesna; LAZIC, Zarko et al.Journal of micromechanics and microengineering (Print). 2012, Vol 22, Num 11, issn 0960-1317, 115011.1-115011.11Article

Efficient large volume data preparation for electron beam lithography for sub-45nm nodeCHOI, Kang-Hoon; GUTSCH, Manuela; FREITAG, Martin et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 816621.1-816621.9, 2Conference Paper

The Potential for Economic Application of Maskless Lithography in Semiconductor Manufacturing : ENGINEERING AND TECHNOLOGY MANAGEMENTNEIL BERGLUND, C; LEACHMAN, Robert C.IEEE transactions on semiconductor manufacturing. 2010, Vol 23, Num 1, pp 39-52, issn 0894-6507, 14 p.Article

Maskless Lithography and Nanopatterning with Electron and Ion Multi-Beam ProjectionPLATZGUMMER, Elmar.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7637, issn 0277-786X, isbn 978-0-8194-8051-4 0-8194-8051-7, 763703.1-763703.12Conference Paper

AIGaN/GaN HFETs fabricated from maskless selectively grown mesas on Si(111) substratesBARDWELL, J. A; HAFFOUZ, S; KOCHTANE, A et al.Electronics Letters. 2007, Vol 43, Num 22, pp 1230-1231, issn 0013-5194, 2 p.Article

The symbiosis of light and matter : Laser-engineered materials for photo-functionality : Laser direct-write processingLIVINGSTON, F. E; HELVAJIAN, H.MRS bulletin. 2007, Vol 32, Num 1, pp 40-46, issn 0883-7694, 7 p.Article